英***Oxford OpAL ® 开放式样品载入ALD设备

紧凑型开放式样品载入原子层沉积（ALD）系统

OpAL提供了专业的热ALD设备，可以简单明了的升***使用等离子体，使得在同***紧凑设备中集成了等离子体和热ALD。

· 开放式样品载入热ALD，集成等离子体技术

· 现场升***到可使用等离子体

· 从小晶片到200mm大晶片

适用于学术、产业、研发的热和/或等离子体化学产品，可用于：

氧化物： HfO2, Al2O3, TiO2, SiO2, ZnO, Ta2O5
氮化物：TiN, Si3N4
金属： Ru, Pt

ALD应用举例：

· 纳米电子学

· 高k栅极氧化物

· 存储电容器绝缘层-铜连线间的高纵横比扩散势垒区

· 有机发光二极管和聚合物的无针孔钝化层

· 钝化晶体硅太阳能电池

· 应用于微流体和MEMS的高保形涂层

· 纳米孔结构的涂层

· 生物微机电系统

· 燃料电池

直观性强的的软件提高性能

使用与牛津仪器的值得信赖的Plasmalab ®产品***族相同的软件平台， OpAL的程序驱动、多用户***别、PC2000TM控制的软件易于操作且可为快速ALD做相应修改。

Compact open sample loading atomic layer deposition (ALD) system

OpAL provides professional thermal ALD equipment that can be easily upgraded using plasma so that plasma ａnd thermal ALD are integrated in the same compact device.

· open sample loading ALD, integrated plasma technology

· upgrade the site to use plasma

· small to 200mm chips

Thermal and/or plasma chemical products suitable for academic, industrial, research ａnd development use:

Oxides: HfO2, Al2O3, TiO2, SiO2, ZnO, Ta2O5

Nitride: TiN, Si3N4

Metal: Ru, Pt

ALD application examples:

· nano electronics

· high k gate oxides

· high aspect ratio diffusion barrier area between storage capacitor insulation layer ａnd copper wire

· pinhole-free passivation layer for organic light-emitting diodes ａnd polymers

· passivated crystalline silicon solar cells

· high conformal coatings for microfluidics ａnd MEMS applications

· coating of nanopore structure

· biological micro-electromechanical system

· fuel cell

Intuitive software improves performance

Using the same software platform as Oxford instruments＇ trust-worthy Plasmalab ® family of products, OpAL＇s program-driven, multi-user level, PC2000TM controlled software is easy to operate ａnd can be modified for fast ALD.